-A A +A
Ultra low energy ion implantation is a promising technique for the wafer-scale fabrication of Silver nanoparticle planar arrays embedded in thermal silica on silicon substrate. The stability versus time of these nanoparticles is studied at ambient conditions on a time scale of months. The plasmonic signature of Ag NPs vanishes several months after implantation for as-implanted samples, while samples annealed at intermediate temperature under N2 remain stable. XPS and HREM analysis evidence the presence of Silver oxide nanoparticles on aged samples and pure Silver nanoparticles on the annealed ones. This thermal treatment does not modify the size-distribution or position of the particles but is very efficient in stabilizing the metallic particles and to prevent any form of oxidation.
American Institute of Physics
Publication date: 
15 May 2011

Patrizio Benzo, Laura Cattaneo, Cosmin Farcau, Andrea Andreozzi, Michele Perego, Gérard Benassayag, Béatrice Pécassou, Robert Carles, Caroline Bonafos

Biblio References: 
Volume: 109 Issue: 10 Pages: 103524
Journal of Applied Physics