We are pleased to propose the 1st Workshop on Sequential Infiltration Synthesis (SIS 2019) on October 16, 2019 in Milan (Italy) in conjunction with the 5th Directed Self-Assembly Symposium (DSA 2019) that will be held on October 16-18, 2019.

The intersection of different communities interested in SIS, originated either from research on atomic layer deposition (ALD) or on advanced lithography, evidences the need of an event to bring together and to contaminate the different approaches to this topic. The aim of this one-day workshop is to address this need gathering leading scientists working on or interested in SIS to give an overview of current topics in the field.

This one-day workshop will focus on the challenges related to potential applications of SIS as well as on the fundamental mechanisms. It will offer an event dedicated to present, discuss, exchange knowledge, and getting informed about the most recent developments. It will provide an opportunity for meeting, exchanging ideas, and designing new paths for collaborative research.

Organizing Committee

Gabriele Seguini, Elena Cianci, Michele Perego, Claudia Wiemer
CNR-IMM, Unit of Agrate Brianza, Italy