We are pleased to propose the 2nd Workshop on Sequential Infiltration Synthesis (SIS 2020) that will be held online on December 14-15, 2020. The workshop will include two half days of talks and discussions from 3 pm to 6 pm (CET, Rome time). Registration will be mandatory but no conference fee will be charged. For more information please contact info-sis-2020@mdm.imm.cnr.it


Sequential infiltration synthesis (SIS) has emerged as a viable preparation route for hybrid inorganic/organic materials, by penetration of gaseous metal precursors into polymer films, fibers, foams, or biomaterials. The incorporation of inorganic materials into organic matrices offers the possibility to enhance the functional properties of the final composite (i.e. mechanical strength, chemical etch resistance, optical properties, etc.). Typical SIS process consists of a controlled sequence of metal-organic precursor and coreactant vapor exposures of the organic samples in an atomic layer deposition (ALD) reactor. In particular, infiltration in lithographically patterned polymeric thin films or in self-assembled or directed self-assembled (DSA) block copolymer (BCP) films allows the formation of inorganic nanostructures, once the polymer matrix is removed by a plasma or annealing step. Simply replicating the patterned polymer or BCP templates, metal oxide (Al2O3, TiO2, SiO2, or ZnO) and metal (W) nanoarchitectures have been directly fabricated, for applications as sub-20 nm enhanced lithographic masks or as active elements in advanced nanoscale electronic devices.


The deadline for abstract submission is: November 21st, 2020.


Organizing Committee


  • Michele Perego, CNR-IMM, Unit of Agrate Brianza, Italy
  • Gabriele Seguini, CNR-IMM, Unit of Agrate Brianza, Italy
  • Tamar Segal-Peretz, Technion- Israel Institute of Technology, Israel
  • Chang-Yong Nam, Brookhaven National Laboratory, USA




2020-11-04 to 2020-12-15